PUBLICATIONS in SCI International Journals
Patents: No patent as up to date as I was outside India. I am eager to have it at IIT Delhi.
Relevant to my work and experience, publications are categorized as material science, nanoscience and plasma diagnostics, basic plasma sources and plasma technologies, and fusion plasmas.
Plasma source, Material Science, Nanoscience and Plasma diagnostics
58 Salini Datta, J. G. Han, R. Kumar, and B. B. Sahu, "Experimental studies and COMSOL 1-D simulation in Ar capacitively coupled plasmas" AIP Advances 14,
015046 (2024). https://doi.org/10.1063/5.0174990
57 B. B. Sahu, K. Nakane, K. Ishikawa, M. Sekine, T. Tsutsumi, T. Gohira, Y. Ohya, N. Ohno and M. Hori, "Study of optical emission spectroscopy using modified
Boltzmann plot in dual frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process"
Phys. Chem. Chem. Phys., 2022, DOI: 10.1039/D2CP00289B. https://doi.org/10.1039/D2CP00289B
56. L. Wen, B. B. Sahu, G. Y. Yeom and J. G. Han “Room temperature deposition of very thin and flexible crystalline ITO thin film using 3-D facing-magnetron
sputtering plasma source” Vacuum, 193, 110520 (2021) (ISSN: 0042-207X). https://doi.org/10.1016/j.vacuum.2021.110520
55 L. Wen, B. B. Sahu, G. Y. Yeom, J. G. Han “Improved Electrical and Optical Properties of Ultra-Thin Tin Doped Indium Oxide (ITO) Thin Films by a 3-
Dimensionally Confined Magnetron Sputtering Source” Sci. Advanced Mater. 13, 498 (2021). DOI: https://doi.org/10.1166/sam.2021.4020
54 B. B. Sahu, Min W. Lee, W. Long, J. Han “Role of plasma parameters on the characteristics properties of flexible transparent ITO films deposited by 3-D
facing and planar facing magnetron sources” AIP Advances 10,105231 (2020) (ISSN: 2158-3226). https://doi.org/10.1063/5.0017519
53 N. Liu, J. Kim, J. Oh, Q. T. Nguyen, B. B. Sahu, J. G. Han and S. Kim, “Growth of multi-orientated polycrystalline MoS2 using plasma-enhanced chemical vapor
deposition for efficient hydrogen evolution reactions, Nanomaterials 10, 1465 (2020) (ISSN 2079-4991). doi:10.3390/nano10081465
52 S. Kar, B. B. Sahu, H. Kousaka, J. G. Han, and M. Hori “Study of the effect of normal load on friction coefficient and wear properties of CNx thin films” AIP
Advances 10, 065214 (2020) (ISSN: 2158-3226). doi: 10.1063/5.0009783
51 B. B. Sahu, S. H. Kim, S. Kim, J. G. Han, S. Kim “Plasma diagnostic in LiMn2O4 thin film process for Li-ion battery application” Surface and Coatings
Technology 126066, 397 (2020) (ISSN: 0257-8972). https://doi.org/10.1016/j.surfcoat.2020.126066
50 B. B. Sahu, S. I. Kim, M. W. Lee, and J. G. Han “Effect of helium incorporation on plasma parameters and characteristic properties of hydrogen free carbon
films deposited using DC magnetron sputtering” Journal of Applied Physics, 127, 014901 (2020) (ISSN: 0021-8979). https://doi.org/10.1063/1.5115449
49 B. B. Sahu, W. Long, S. H. Kim, and J. G. Han “Study of plasma characteristic and properties of flexible ultra-thin ITO films prepared by large area 3-D
confined and planar magnetron sputtering” Vacuum, 165, 246-253 (2019) (ISSN: 0042-207X). https://doi.org/10.1016/j.vacuum.2019.04.029
48 J. S. Lee, B. B. Sahu, and J. G. Han, “Effect of the RF power on the characteristic properties of high-performance silicon nitride single-layer permeation
barriers” Surface and Coatings Technology, 364, 63-69 (2019) (ISSN: 0257-8972). https://doi.org/10.1016/j.surfcoat.2019.02.032
47 W. Long, B. B. Sahu, and J. G. Han “Study on the electrical, optical, structural, and morphological properties of highly transparent and conductive AZO thin
films prepared near room temperature” Applied Surface Science, 473, 649–656 (2019) (ISSN: 0169-4332). https://doi.org/10.1016/j.apsusc.2018.11.250
46 B. B. Sahu, J. S. Lee, S. H. Kim and J. G. Han, “Comparison of plasma characteristics in normal and multiple holes hollow cathode RF PECVD and their
effectiveness for a-SiNx:H thin film deposition” Vacuum, 160, 316-324 (2019) (ISSN: 0042-207X). https://doi.org/10.1016/j.vacuum.2018.11.034
45 B. B. Sahu, W. Long, J. H. Kwon, and J. G. Han “Factors affecting the properties of highly conductive flexible ultrathin ITO films in confined large area
magnetron sputtering in three dimensions” AIP Advances, 8, 105112 (2018) (ISSN: 2158-3226). https://doi.org/10.1063/1.5053570
44 H. R. Kim, B. B. Sahu, and J. G. Han “Direct Synthesis of Magnetron Sputtered Nanostructured Cu Films with Desired Properties via Plasma Chemistry for
Their Efficient Antibacterial Application” Plasma Processes and Polymers, 15, e1800009 (2018) (ISSN: 1612-8869).https://doi.org/10.1002/ppap.201800009
43 W. Long, B B. Sahu, and J. G. Han “Approach for the optimization of characteristic properties of very high conductive ITO thin films using advanced
magnetron plasma process” Materials Research Express, 5, 066415 (2018) (ISSN: 2053-1591).https://doi.org/10.1088/2053-1591/aacae1
42 B. B. Sahu, S. B. Jin, P. J. Xiao, J. B. Kim, and J. G. Han “Effect of inductively coupled plasma and plasma parameters on magnetron sputtered Al-Doped ZnO
highly conductive thin films at Low-temperature” Journal of Applied Physics, 123, issue 20, 205107 (2018) (ISSN: 0021-8979).
https://doi.org/10.1063/1.5022708
41 B. B. Sahu, W. Long, and J. G. Han “Highly conductive flexible ultra thin ITO nanoclusters prepared by 3-D confined magnetron sputtering at a low
temperature” Scripta Materialia, 149, 98-102 (2018) (ISSN: 1359-6462). https://doi.org/10.1016/j.scriptamat.2018.02.018
40 B. B. Sahu, J. G. Han, and H. Toyoda “Effectiveness of plasma and radical control for the low temperature synthesis and properties of a-SiNx:H films using
RF-Microwave PECVD” Physics of plasmas, 25, 023511 (2018) (ISSN: 1070-664X). https://doi.org/10.1063/1.5016618
39 B. B. Sahu, Y. Yin, and J. G. Han “Controlled Growth, Microstructure and Properties of Functional Si Quantum Dot Films via Plasma Chemistry and Activated
Radicals” Journal of Physical Chemistry C, 121, 10194-10209 (2017) (ISSN: 1932-7447). https://pubs.acs.org/doi/10.1021/acs.jpcc.7b02430
38 B. B. Sahu, J. G. Han, and H. Kersten “Shaping thin film growth and microstructure pathways via plasma and deposition energy: a detailed theoretical,
computational and experimental analysis” Physical Chemistry Chemical Physics, 19, 5591-5610 (2017) (ISSN 1463-9076).
https://pubs.rsc.org/en/content/articlelanding/2017/cp/c6cp06003j
37 J. S. Lee, B. B. Sahu, and J. G. Han, “Simple realization of efficient barrier performance of a single layer silicon nitride film simply via plasma chemistry”
Physical Chemistry Chemical Physics, 18, 32198- 32209 (2016) (ISSN 1463-9076). https://pubs.rsc.org/en/content/articlelanding/2016/cp/c6cp06722k
36 B. B. Sahu, Y. Yin, S. Gauter, H. Kersten, and J. G. Han “Plasma engineering of silicon quantum dots and their properties through energy deposition and
chemistry” Physical Chemistry Chemical Physics, 18, 25837- 25851 (2016) (ISSN 1463-9076).
https://pubs.rsc.org/en/content/articlelanding/2016/cp/c6cp05647d
35 B. B. Sahu, Y. Y. Yin, J. S. Lee, J. G. Han, and M. Shiratani “Plasma diagnostic approach for the low-temperature deposition of silicon quantum dots using
dual frequency PECVD” Journal of Physics D: Applied Physics, 49, issue 39, 395203 (2016) (ISSN: 1361-6463).
https://iopscience.iop.org/article/10.1088/0022-3727/49/39/395203
34 B. B. Sahu, Y. Y. Yin, J. G. Han, and M. Shiratani “Low temperature synthesis of silicon quantum dots made with plasma chemistry control in dual frequency
non-thermal plasmas” Physical Chemistry Chemical Physics, 18, 15697- 15710, (2016) (ISSN 1463-9076).
https://pubs.rsc.org/en/content/articlelanding/2016/cp/c6cp01856d
33 B. B. Sahu, Y. Y. Yin, T. Tsutsumi, M. Hori, and J. G. Han, “The Role of plasma chemistry on functional silicon nitride films properties deposited at low-
temperature by mixing two frequency powers using PECVD” Physical Chemistry Chemical Physics, 18, 13033, (2016) (ISSN 1463-9076).
https://pubs.rsc.org/en/content/articlelanding/2016/CP/C6CP00986G
32 B. B. Sahu, Y. Y. Yin and J. G. Han “Effect of plasma parameters on characteristics of silicon nitride film deposited by single and dual frequency PECVD”
Physics of Plasmas, 23, issue 1, 033512, (2016) (ISSN: 1070-664X). http://dx.doi.org/10.1063/1.4944675
31 B. B. Sahu, K. S. Shin, and J. G. Han “Integrated Approach for Low Temperature Synthesis of High Quality Silicon Nitride Films in PECVD using RF/UHF Hybrid
Plasmas” Plasma Sources Science and Technology, 25, issue 1, 015017, (2016) (ISSN: 1361-6595).
https://iopscience.iop.org/article/10.1088/0963-0252/25/1/015017
30 B. B. Sahu, Jeon G. Han, J. B. Kim, M. Kumar, S. B. Jin, and M. Hori, “Study of plasma properties for the low-temperature deposition of highly conductive
Aluminum doped ZnO film using ICP assisted DC magnetron sputtering” Plasma Processes and Polymers, 13, issue 1, 134-146 (2016) (ISSN: 1612-8869).
https://onlinelibrary.wiley.com/doi/abs/10.1002/ppap.201500094
29 B. B. Sahu, J. G. Han, K. S. Shin, and M. Hori “Nitrogen radical and plasma diagnostics in dual frequency hybrid plasmas to investigate N2/SiH4 PECVD
process” Plasma Processes and Polymers, 13, issue 4, 447-458 (2016) (ISSN: 1612-8869). https://onlinelibrary.wiley.com/doi/abs/10.1002/ppap.201500116
28 K. S. Shin, B. B. Sahu, M. Kumar, K. Leksakul, and J. G. Han, “Tailoring of microstructure in hydrogenated nanocrystalline Si thin Flms by ICP-assisted RF
magnetron sputtering” Journal of Physics D: Applied Physics, 48, 475303 (2015) (ISSN: 1361-6463).
https://iopscience.iop.org/article/10.1088/0022-3727/48/47/475303/meta
27 L. Wen, M. Kumar, B. B. Sahu, S. B. Jin, C. Sawangrat, K. Lekasakul, J.G. Han, “Advantage of dual-confined Plasmas over conventional and facing-target
Plasmas for improving transparent-conductive properties in Al doped ZnO thin films”, Surface and Coatings Technology, 284, 85-89 (2015) (ISSN: 0257-
8972). http://dx.doi.org/10.1016/j.surfcoat.2015.06.084
26 S. I. Kim, K. W. Lee, B. B. Sahu and J. G. Han, “Flexible OLED fabrication with ITO thin film on polymer substrate” Japanese Journal of Applied Physics, 54,
090301 (2015) (ISSN: 1347-4065). http://dx.doi.org/10.7567/JJAP.54.090301
25 M. Kumar, L. Wen, B. B. Sahu and J. G. Han, “Simultaneous enhancement of carrier mobility and concentration via tailoring of Al-chemical states in Al-ZnO
thin films” Applied Physics Letters, 106, 241903 (2015) (ISSN: 0003-6951). http://dx.doi.org/10.1063/1.4922732
24 B. B. Sahu, J. G. Han, K. S. Shin, K. Ishikawa, M. Hori and Y. Miyawaki, “Plasma diagnostic approach for high rate nanocrystalline Si synthesis in RF/UHF
hybrid plasmas using PECVD process” Plasma Sources Science and Technology, 24, 025019 (2015) (ISSN: 1361-6595).
https://iopscience.iop.org/article/10.1088/0963-0252/24/2/025019
23 B. B. Sahu, J. G. Han, M. Hori, and K. Takeda, “Langmuir probe and optical emission spectroscopy studies in magnetron sputtering plasmas for Al-doped
ZnO film deposition” Journal of Applied Physics 117, 023301 (2015) (ISSN: 0021-8979). http://dx.doi.org/10.1063/1.4905541
22 K. S. Shin, B. B. Sahu, J. G. Han, and M. Hori, “Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in ICP assisted
magnetron sputtering” Japanese Journal of Applied Physics 54, 060303 (2015) (ISSN: 1347-4065). http://dx.doi.org/10.7567/JJAP.54.060303
21 S. B. Jin, W. Long, B. B. Sahu, and J. G. Han, “Improving the Gas Barrier and Mechanical Properties of a-SiOx Films Synthesized at Low Temperature By Using
High Energy and Hydrogen Flow Rate Control” Journal of Korean Physical Society 66, issue 9, 1410-1415 (2015) (ISSN: 0374-4884,).
https://scienceon.kisti.re.kr/srch/selectPORSrchArticle.do?cn=NART73497154
20 S. I. Kim, B. B. Sahu, S. E. Kim, A. Ali, E. H. Choi, and J. G. Han, “Controlling conductivity of carbon film for L-929 Cell biocompatibility using magnetron
sputtering plasmas” Journal of Materials Chemistry B, 3, 3267-3278 (2015) (ISSN 2050-750X).
https://pubs.rsc.org/en/content/articlelanding/2015/tb/c4tb01397b
19 S. I. Kim, B. B. Sahu, B. M. Weon, J. G. Han, J. Koskinen, and S. Franssila, “Making porous conductive carbon films with unbalanced magnetron sputtering”
Japanese Journal of Applied Physics 54, 010304 (2015) (ISSN: 1347-4065). http://dx.doi.org/10.7567/JJAP.54.010304
18 B. B. Sahu, Kyung S. Shin, Su. B. Jin, Jeon G. Han, K. Ishikawa, and M. Hori, “Effectiveness of Plasma Diagnostic in UHF and RF Hybrid Plasmas for Synthesis
of Silicon Nitride Film at Low Temperature” Journal of Applied Physics 116, 134903 (2014) (ISSN: 0021-8979). http://dx.doi.org/10.1063/1.4896833
Basic Plasma Sources and plasma technologies
17 B. B. Sahu, L. Wen, and J. G. Han “Instabilities and plasma flares in moderate-current confined magnetron sputtering in three dimensions” Physical Review
Applied, 10, 054042 (2018) (ISSN 2331-7019). https://journals.aps.org/prapplied/abstract/10.1103/PhysRevApplied.10.054042
16 L. Wen, B. B. Sahu, and J. G. Han “Development and utility of a new 3-D magnetron source for high rate deposition of highly conductive ITO thin films near
room temperature” Physical Chemistry Chemical Physics, 20, 4818-4830 (2018) (ISSN 1463-9076).
https://pubs.rsc.org/en/content/articlelanding/2018/cp/c7cp07318f
15 B. B. Sahu, S. Koga, H. Toyoda, and J. G. Han, “Development and plasma characterization of an 850 MHz surface-wave plasma source” AIP Advances, 7,
105213 (2017) (ISSN: 2158-3226). https://aip.scitation.org/doi/full/10.1063/1.4995442
14 B. B. Sahu, S. B. Jin, and J. G. Han, “Development and characterization of a multi-electrode cold atmospheric pressure DBD plasma jet aiming plasma
application” Journal of Analytical Atomic Spectrometry, 32, 782-795, (2017) DOI: 10.1039/c6ja00419a (ISSN: 0267-9477).
https://pubs.rsc.org/en/content/articlelanding/2017/ja/c6ja00419a
13 B. B. Sahu and J. G. Han, “Comparison of plasma excitation, ionization and energy influx in single and dual frequency capacitive discharges” Physics of
plasmas, 23, 123504, issue 12 (2016) (ISSN: 1070-664X). https://aip.scitation.org/doi/10.1063/1.4969088
12 B. B. Sahu and J. G. Han, “Electron heating mode transition induced by mixing radio frequency and ultrahigh frequency dual frequency powers in capacitive
discharges” Physics of Plasmas, 23, 053514, issue 5 (2016) (ISSN: 1070-664X). https://aip.scitation.org/doi/10.1063/1.4952629
11 B. B. Sahu, J. G. Han, H. R. Kim, K. Ishikawa, and M. Hori, “Experimental evidence of warm electron populations in magnetron sputtering plasmas” Journal of
Applied Physics 117, issue 3, 033301 (2015) (ISSN: 0021-8979). https://aip.scitation.org/doi/10.1063/1.4905901
10 K. S. Shin, B. B. Sahu, J. G. Han, and M. Hori, “Utility of dual frequency hybrid source on plasma and radical generation in SiH4/H2 PECVD process” Japanese
Journal of Applied Physics 54, 076201(2015) (ISSN: 1347-4065). http://dx.doi.org/10.7567/JJAP.54.076201
9 B. B. Sahu, A. Ganguli & R. D. Tarey, “Warm electrons are responsible for helicon plasma production” Plasma Sources Science and Technology 23, 065050
(2014) (ISSN: 1361-6595). https://iopscience.iop.org/article/10.1088/0963-0252/23/6/065050
8 B. B. Sahu, R.D. Tarey, and A. Ganguli “Experimental Investigation of Current Free Double Layers in Helicon Plasmas” Physics of Plasmas 21, 023504 (2014)
(ISSN: 1070-664X). https://aip.scitation.org/doi/10.1063/1.4864651
7 B. B. Sahu, A. Ganguli, and R.D. Tarey, “Observation of Multiple Current Free Helicon Double Layers” Applied Physics Letters 103, 184105-1 (2013) (ISSN:
0003-6951). https://doi.org/10.1063/1.4828559
6 A. Ganguli, B. B. Sahu, and R.D. Tarey, “Evidence of current free double layer in high density helicon discharge” Physics of Plasmas 20, 013510 (2013) (ISSN:
1070-664X). https://aip.scitation.org/doi/10.1063/1.4789455
5 R. D. Tarey, B. B. Sahu and A. Ganguli, “Understanding Helicon Plasmas”, Physics of Plasmas 19, issue 7, 073520 (2012) (ISSN: 1070-664X).
https://aip.scitation.org/doi/10.1063/1.4739779
4 A. Ganguli, B. B. Sahu and R. D. Tarey, ‘Investigation of absorption mechanisms in helicon discharges in conducting waveguides’ Plasma Sources Science
and Technology 20, 015021 (2011) (ISSN: 1361-6595). https://iopscience.iop.org/article/10.1088/0963-0252/20/1/015021
3 A. Ganguli, B. B. Sahu, and R.D. Tarey, “A new structure for RF compensated Langmuir probes with external filters tunable in absence of plasma” Plasma
Sources Science and Technology 17, 015003 (2008) (ISSN: 1361-6595). https://iopscience.iop.org/article/10.1088/0963-0252/17/1/015003
2 A. Ganguli, B. B. Sahu, and R.D. Tarey, “Helicon wave modes, their damping and absorption in lossy plasma loaded conducting waveguide” Physics of
Plasmas 14, issue 11, 113503 (2007) (ISSN: 1070-664X). https://aip.scitation.org/doi/10.1063/1.2804702
Fusion Plasmas
1 B. B. Sahu, Y. S. Bae, J. H. Jeong, M. Joung, J. G. Kwak, W. S. Han and I. Rhee, “ECCD Performance Analysis of future KSTAR ECH systems for Extended
Applications” Journal of Korean Physical Society 65, issue 8, 1282-1289 (2014) (ISSN: 0374-4884). https://link.springer.com/article/10.3938/jkps.65.1282