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My work has been based on the following key directions.
1. Design and development of the plasma sources and diagnostic tools, and study the plasma generation mechanism and its effectiveness.


2. Design of the plasma processes using these sources for any intended applications.

3. Plasma based synthesis of novel functional nano-materials (techniques developed and used: Magnetron sputtering, PECVD, Plasma etching)


4. Study the synergy of Plasma science with nano-structure formation and controlling the properties of materials.

5. Development of process and technology for renewable and storage devices.


6. Atmospheric pressure plasmas for bio and healthcare applications.

7. RF heating and current drives in tokamak plasmas during my postdoc.

Research Interest: 

(i)   Understanding plasma generation mechanism 

(ii) Development of plasma sources and diagnostic tools for basic study on plasma generation and their applications.

(iii)  Plasma based Energy, Electronic, Healthcare, functional materials, etc.

(iv) Advanced functional materials (using plasma based deposition methods like magnetron sputtering and plasma enhanced chemical vapor deposition (PECVD), etc.) for different applications. 

(v) Plasma process for renewable energy resources.

(vi)  High aspect ratio etching by advanced plasma processes for semiconductor processing.

(vii) Small to large area atmospheric pressure plasma source for medicinal and agriculture applications.

Simulation and experimental activities have been initiated to undertake both basic and interdisciplinary research. Apart from this, both national and international collaborations are going on.

I would welcome funding support from Industry.

Thanks for your visit !

Call

T: 91-11-2659-1259

Highlights

Nisha and B. B. Sahu, Overall aspect for designing magnetron sputtering plasma
sources and their applications in the deposition of ITO films, AIP Advances 14, 050702 (2024).

 

https://doi.org/10.1063/6.0003496

Salini Datta, J. G. Han, R. Kumar, and B. B. Sahu, "Experimental studies and COMSOL 1-D simulation in Ar capacitively coupled plasmas" AIP Advances 14, 015046 (2024).

https://doi.org/10.1063/5.0174990

Preference will be given to students with JRF.

Apply for the Full time (through JRF or GATE) or Part time PhD  and MS(R) positions in DESE. The next interview for the Ph.D. programme will be done around Nov. - Dec. 2024. Keep on checking DESE Departmental or IIT Website. If you can work on our areas of interest for the Ph.D. you need to upload a statement of purpose (SOP) during your online submission. Also, you need to mention plasma sources and material processing for societal applicationsPart time scholar and candidate with JRF for full time research are also welcome. 

Interested candidate can also send the CV and statement of purpose to show the interest and get a chance to interact.

​I am looking forward for industrial partners for collaboration, consultation and taking up projects using plasma based technologies. Please discuss your problem to find a solution. Looking for a closed and tight collaboration with mutual interest.

 

Updated News

1. MoU made for developing process technology for green H2 and functional material.

2. MoU made for developing process technology for healthcare.

3. 1ST Global Forum and International Workshop in Hybrid Mode on Industrial Plasma Processes and Diagnostics 2024 (IPPD 2024).

To participate and/or submit the abstract kindly refer to the  website: 

https://ippd2024iitd.wixsite.com/event

4. MoU made for developing process technology for diamond crystal.

 

Plasma is a tool for the service of mankind.

Industries can achieve anything using recent plasma based technologies.

I am looking forward to industrial and funding partners to generate human resources and taking up projects, consultation, and collaboration.

Contact me for a discussion with mutual interest.

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